Cleaning base station and cleaning robot system

ABSTRACT

A cleaning base station for a cleaning robot includes a base. The base defines a maintenance space. The cleaning base station further includes at least two of a debris suction device, a sewage pumping device, a cleaning liquid pumping device, a filtering device and a sterilization device. The at least two of the debris suction device, the sewage pumping device, the cleaning liquid pumping device, the filtering device and the sterilization device are installed in the maintenance space.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present disclosure claims priority of Chinese Patent Application No.202111445270.X, filed on Nov. 30, 2021, titled “cleaning base stationand cleaning robot system”, the contents of which are incorporatedherein by reference.

TECHNICAL FIELD

The present disclosure relates to the technical field of cleaningequipments, and in particular, relates to a cleaning base station and acleaning robot system.

BACKGROUND

A cleaning base station is a kind of equipment used in cooperation witha cleaning robot. The cleaning base station can perform a variety ofmaintenance works on the cleaning robot. The cleaning base station mayclean mopping members (such as roller brush, mop cloth, etc.) of thecleaning robot, the cleaning base station may also recover the debrisfrom the cleaning robot, and the cleaning base station can perform avariety of maintenance works on the cleaning robot.

In order to perform various maintenance works on the cleaning robot, thecleaning base station needs to be equipped with various performingdevices. The installation of various performing devices on the existingcleaning base station is scattered, which not only easily leads to thetoo large volume of the entire cleaning base station, but also makes itinconvenient to maintain various performing devices.

SUMMARY

An embodiment of the present disclosure provides a cleaning base stationfor a cleaning robot. The cleaning base station includes a base. Thebase defines a maintenance space. The cleaning base station furtherincludes at least two of a debris suction device, a sewage pumpingdevice, a cleaning liquid pumping device, a filtering device and asterilization device. The at least two of the debris suction device, thesewage pumping device, the cleaning liquid pumping device, the filteringdevice and the sterilization device are installed in the maintenancespace.

Another embodiment of the present disclosure provides a cleaning robotsystem. The cleaning robot system includes a cleaning robot and theabove-mentioned cleaning base station. The cleaning base station isconfigured to maintain the cleaning robot.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to explain embodiments of the present disclosure or technicalsolutions in the prior art more clearly, attached drawings required inthe description of the embodiments or the prior art will be brieflyintroduced below. Obviously, the attached drawings in the followingdescription are only some embodiments of the present disclosure. Forthose of ordinary skill in the art, other drawings can be obtainedaccording to the structures shown in these attached drawings withoutcreative labor.

FIG. 1 a functional block view of a cleaning base station according toan embodiment of the present disclosure;

FIG. 2 is a schematic structural view of the cleaning base station inFIG. 1 ;

FIG. 3 is another view of the cleaning base station in FIG. 1 ;

FIG. 4 is a schematic structural view of a chassis of a base of thecleaning base station in FIG. 1 ;

FIG. 5 is another functional block view of the cleaning system; and

FIG. 6 is a functional block view of a cleaning robot system accordingto another embodiment of the present disclosure.

Implementation of objectives, functional features and advantages of thepresent disclosure will be further described in combination withembodiments and with reference to attached drawings.

DETAILED DESCRIPTION

Hereinafter, technical solutions in embodiments of the presentdisclosure will be described clearly and completely with reference toattached drawings in the embodiments of the present disclosure.Obviously, the embodiments described are only part but not all of theembodiments of the present disclosure. Based on the embodiments of thepresent disclosure, all other embodiments obtained by those of ordinaryskill in the art without creative labor belong to the protective scopeclaimed in the present disclosure.

It shall be noted that, all directional indicators (such as up, down,left, right, front, back and so on) in the embodiment of the presentdisclosure are only used to explain relative position relationships andmovement situations among components in a specific posture (as shown inthe attached drawing). If the specific posture changes, the directionalindicators will change accordingly.

In addition, in the present disclosure, descriptions such as “first”,“second” or the like are only used for descriptive purposes and shouldnot be understood as indicating or implying the relative importancethereof or implicitly indicating the number of indicated technicalfeatures. Therefore, features defined with “first” and “second” mayexplicitly or implicitly include at least one of the features. Inaddition, technical solutions among the embodiments may be combined witheach other on the basis that they can be realized by those of ordinaryskill in the art. When the combination of the technical solutions iscontradictory or impossible to be realized, it should be considered thatsuch combination of the technical solutions does not exist, and it isnot within the protective scope claimed in the present disclosure.

The cleaning robot system in the present disclosure includes a cleaningrobot and a cleaning base station, wherein the cleaning robot isconfigured to perform cleaning and the cleaning base station isconfigured to perform maintenance of the cleaning robot. To facilitatethe understanding of the cleaning robot and the cleaning base station,the cleaning robot and the cleaning base station are briefly introducedbelow.

Cleaning robots include commercial cleaning robots and householdcleaning robots. The cleaning robots may be cleaning equipments whichare capable of autonomously accomplishing cleaning works, such as floorsweeping robots, floor mopping robots, floor washing robots, floorsweeping and mopping machines or the like. The cleaning robots may alsobe cleaning equipments which accomplish cleaning workssemi-automatically, such as hand-held and remote-controlled cleaningequipments requiring manual operation.

The mopping members carried by the cleaning robot can clean surfaces tobe cleaned, such as the floor and carpet. The mopping members on thecleaning robot may be rotary mops in the shape of disks or the shapesimilar to disks, or flat mops that vibrate or move up and down or not.

The cleaning base station may charge the cleaning robot, or recover thedebris from the cleaning robot, or clean and air dry the mopping membersof the cleaning robot, or replace the mopping members of the cleaningrobot, or inject water into the cleaning robot, and the cleaning basestation may also perform other actions on the cleaning robot, which arenot listed herein.

Referring to FIG. 1 and FIG. 2 , the cleaning base station 1000 includesat least two of a base 100, a debris suction device 110, a sewagepumping device 200, a cleaning liquid pumping device 210, a filteringdevice 300 and a sterilization device 400, and the at least two of thedebris suction device 110, the sewage pumping device 200, the cleaningliquid pumping device 210, the filtering device 300 and thesterilization device 400 are installed on the base 100.

As the bearing component of the whole cleaning base station 1000, thebase 100 not only has high strength, but also has a pleasant appearance.The base 100 may be provided in many shapes. The base 100 may becylindrical, L-shaped, C-shaped, or provided in other shapes, and thisis not specifically limited herein.

The base 100 is provided thereon with a maintenance space, which is acertain space position on the base 100. The maintenance space may beformed on the surface of the base 100 or formed inside the base 100, orone part of the maintenance space may be located inside the base 100 andthe other part thereof may be located outside the base 100. Here, thespecific location at which the maintenance space is positioned is notlimited.

The debris suction device 110 is mainly configured to suck the debris,paper scraps and other sundries in the debris collection cavity of thecleaning robot, so as to recycle and centrally treat the debris, paperscraps and other sundries in the debris collection cavity of thecleaning robot. The debris suction device 110 may be an air pump, acentrifugal fan, a cross-flow fan and other devices that can drive theair to flow. In some embodiments, a centrifugal fan is used as thedebris suction device 110, and the centrifugal fan has the advantages ofgood suction effect, low noise and stable operation.

Both the cleaning liquid pumping device 210 and the sewage pumpingdevice 200 are configured to pump liquid, the cleaning liquid pumpingdevice 210 is configured to pump the cleaning liquid to the positionwhere the mopping members of the cleaning robot can be wetted, and thesewage pumping device 200 is configured to recover the liquid thatcleans the mopping members of the cleaning robot. The cleaning liquidpumping device 210 and the sewage pumping device 200 may be liquidpumps, air pumps and other equipments that can drive the liquid to flow,and this will not be listed herein.

The filtering device 300 is mainly configured to filter the liquid. Thefiltering device 300 may be configured to filter the cleaning liquidpassing through the cleaning liquid pumping device 210 or filter thesewage passing through the sewage pumping device 200, or the filteringdevice 300 may also filter the cleaning liquid passing through thecleaning liquid pumping device 210 and the sewage passing through thesewage pumping device 200 at the same time, and this is not specificallylimited herein.

The filtering device 300 may filter out particles, suspended substances,colored substances or the like in liquid. The filter element of thefiltering device 300 may be a single type filter of element formed byactivated carbon filter element, and the filter element of the filteringdevice 300 may also be a composite type of filter element formed byfilter cotton and activated carbon. The types of filter elements of thefiltering device 300 are not listed herein.

The sterilization device 400 is used to kill bacteria, viruses and othermicroorganisms in liquid. The sterilization device 400 may killbacteria, viruses and other microorganisms in liquid by physical meansor chemical means. For example, the sterilization device 400 may killbacteria, viruses and other microorganisms in liquid by ultravioletrays. For another example, the sterilization device 400 may killbacteria, viruses and other microorganisms in liquid by ozone.

The sterilization device 400 may kill bacteria, viruses and othermicroorganisms in the cleaning liquid passing through the cleaningliquid pumping device 210, and it may also kill bacteria, viruses andother microorganisms in the sewage passing through the sewage pumpingdevice 200. The sterilization device 400 can also kill bacteria, virusesand other microorganisms in the cleaning liquid passing through thecleaning liquid pumping device 210 and the sewage in the sewage pumpingdevice 200 at the same time, and this is not specifically limitedherein.

At least two of the debris suction device 110, the sewage pumping device200, the cleaning liquid pumping device 210, the filtering device 300and the sterilization device 400 described above are arranged at themaintenance space of the base 100. In some embodiments, all of thedebris suction device 110, the sewage pumping device 200, the cleaningliquid pumping device 210, the filtering device 300 and thesterilization device 400 described above are arranged at the maintenancespace of the base 100, which is convenient for the maintenance of theabove devices. At the same time, the structure of the cleaning basestation 1000 can be more compact by integrating the above devices intothe maintenance space.

If the maintenance space on the base 100 is located on the surface ofthe base 100, then the debris suction device 110, the sewage pumpingdevice 200, the cleaning liquid pumping device 210, the filtering device300 and the sterilization device 400 of the cleaning base station 1000are exposed on the outer surface of the base 100, which makes the abovedevices easily affected by external interference. In view of this,referring to FIG. 1 ,the base 100 is provided with an accommodatingcavity 100 a and a maintenance opening 100 b in communication with theaccommodating cavity 100 a, and the cleaning base station 1000 furtherincludes a maintenance plate 500 for covering or opening the maintenanceopening 100 b.

Because the maintenance space is formed by the accommodating cavity 100a, at least two of the debris suction device 110, the sewage suctiondevice 200, the cleaning liquid pumping device 210, the filtering device300 and the sterilization device 400 may be installed inside theaccommodating cavity 100 a, and meanwhile, the maintenance opening 100 bin communication with the accommodating cavity 100 a may be opened orclosed by the maintenance plate 500. In this way, the devices can beprevented from being exposed from the maintenance opening 100 b andaffected by the external interference, and moreover, the maintenanceopening 100 b can be opened by the maintenance plate 500 to facilitateinspection and maintenance or the like for the devices described above.

Further, the maintenance opening 100 b is defined on the side surface ofthe base 100, and the position of the maintenance plate 500 varies withthe change of the arrangement position of the maintenance opening 100 b.That is, the maintenance plate 500 is also located on the side surfaceof the base 100. With such arrangement, when the cleaning base station1000 is placed against the wall, the maintenance plate 500 is located onthe side of the base 100, thereby preventing the maintenance plate 500from interfering with the placement of the cleaning base station 1000,and meanwhile ensuring that the maintenance plate 500 can be normallyopened without moving the base 100.

It shall be noted that, the formation of the accommodating cavity 100 adescribed above is closely related to the specific structure of the base100. The accommodating cavity 100 a described above may be formed by acavity on a certain structural member in the base 100, or theaccommodating cavity 100 a described above may also be cooperativelydefined by a plurality of structural members in the base 100, and thisis not specifically limited herein.

In some embodiments, the accommodating cavity 100 a is cooperativelydefined by a plurality of structural members in the base 100.Specifically, referring to FIG. 2 , the base 100 includes a chassis 110,a liquid tank bracket 120 and a back cover 130. The liquid tank bracket120 is installed above the chassis 110, and in this case, the liquidtank bracket 120 and the chassis 110 form a C-shaped structure. The backcover 130 covers the back side of the liquid tank bracket 120 and theback side of the chassis 110, the accommodating cavity 100 a iscooperatively defined by the back cover 130 and the liquid tank bracket120, and the maintenance opening 100 b is defined on the back cover 130.

It shall be noted that, after the liquid tank bracket 120 is assembledwith the back cover 130, there is a gap formed between the liquid tankbracket 120 and the back cover 130, that is, the accommodating cavity100 a is formed by the gap between the liquid tank bracket 120 and theback cover 130. In this way, the gap formed between the liquid tankbracket 120 and the back cover 130 may be fully utilized to install atleast two of the debris suction device 110, the sewage pumping device200, the cleaning liquid pumping device 210, the filtering device 300and the sterilization device 400 in the cleaning base station 1000, suchthat the structure of the whole cleaning base station 1000 is morecompact, and moreover, the volume of the cleaning base station 1000 canbe reduced.

Further, referring to FIG. 3 and FIG. 4 , the surface part of the liquidtank bracket 120 facing the back cover 130 is recessed to form aninstallation recess 120 a for installing at least two of the debrissuction device 110, the sewage pumping device 200, the cleaning liquidpumping device 210, the filtering device 300 and the sterilizationdevice 400. After the back cover 130, the liquid tank bracket 120 andthe chassis 110 are assembled, the back cover 130 covers theinstallation recess 120 a of the liquid tank bracket 120 to form theaccommodating cavity 100 a. With this arrangement, the volume of theaccommodating cavity 100 a can be ensured, thereby facilitating theintegrated installation of the above devices.

Considering that the cleaning robot needs to park at a fixed positionwhen being cleaned, the base 100 is formed thereon with a cleaning space102 for the cleaning robot to park, and the cleaning space 102 is aspace for the cleaning robot to park. The cleaning space 102 may be aclosed space, and for example, the cleaning space 102 is formed on theupper surface of the base 100. The cleaning space 102 may be a semi-openspace, and for example, the cleaning space 102 is formed by a groovedefined on the side surface of the base 100, and the groove defined onthe side surface of the base 100 may be opened or revealed by a movableplate to form a closed cleaning space 102.

The base 100 is loaded thereon with a liquid storage tank 600. Theliquid storage tank 600 may be a liquid storage container independentfrom the base 100, or the liquid storage tank 600 may be formed by acavity structure on the base 100, and the formation of the liquidstorage tank 600 is not specifically limited herein. The liquid storagetank 600 is used for containing cleaning liquid, the cleaning liquidcontained in the liquid storage tank 600 may be cleaning water,detergent or the mixed liquid of cleaning water and detergent, and thetype of liquid contained in the liquid storage tank 600 is notspecifically limited herein.

Referring also to FIG. 5 , a liquid inlet end of the cleaning liquidpumping device 210 is in communication with the liquid storage tank 600,a liquid outlet end of the cleaning liquid pumping device 210 is locatedat the cleaning space 102, and the cleaning liquid pumping device 210 isconfigured to drive the cleaning liquid to wet the mopping members ofthe cleaning robot, such that the mopping members of the cleaning robotcan accomplish cleaning.

The mopping members of the cleaning robot may be cleaned in many ways.For example, the cleaning robot may be soaked in the cleaning liquid andcleaned through its own rotation. At this time, a cleaning tank isarranged below the cleaning space 102 of the base 100, and the cleaningtank is used for containing the cleaning liquid, such that the moppingmembers of the cleaning robot located at the cleaning space 102can besoaked in the cleaning liquid. The bottom of the cleaning tank isprovided with a sewage suction port 100 c (see FIG. 4 ),so as tofacilitate the discharge of the cleaning liquid in the cleaning tank.

For another example, the mopping members of the cleaning robot may bescraped and cleaned by a rotating scraper. The cleaning space 102 of thebase 100 is provided with a motor and a scraper, the motor is fixed atthe cleaning space 102, and the motor drives the scraper to rotate so asto scrape the mopping members of the cleaning robot, thereby cleaningthe mopping members of the cleaning robot. The cleaning space 102 isfurther provided with these wage suction port 100 c for dischargingsewage, and in an embodiment the sewage suction port 100 c is arrangedat the lowest position of the cleaning space 102.

The liquid inlet end of the sewage pumping device 200 is incommunication with the sewage suction port 100 c, the liquid outlet endof the sewage pumping device 200 is in communication with the liquidstorage tank 600, and the filtering device 300 is connected in serieswith the sewage pumping device 200 and the liquid storage tank 600.Inthe illustrated embodiment, the filtering device 300 is located on theliquid outlet side of the sewage pumping device 200. In anotherembodiment, the filtering device 300 may be located on the liquid inletside of the sewage pumping device 200, and this is not specificallylimited herein.

The sewage pumping device 200 is used to pump the sewage generated fromthe process of cleaning the mopping members of the cleaning robot backto the filtering device 300, the filtering device 300 filters the sewageto filter out the particles, suspended substances and colored substancesor the like in the sewage. In this way, the liquid flowing back into theliquid storage tank 600 from the filtering device 300 is clean, and thecleaning liquid in the liquid storage tank 600 may be recycled, therebyimproving the utilization rate of the cleaning liquid.

The cleaning base station 1000 further includes a filter 700, the filter700 is arranged at the sewage suction port 100 c, and the filter 700 isconfigured to filter out large-volume dirt in the sewage, such as woodchips, paper scraps, clods, hair or the like. In this way, the filteringdevice 300 may be effectively prevented from being blocked bylarge-volume dirt in the sewage.

It shall be noted that, the filter 700 is used to intercept the dirt inthe sewage, so the filter 700 needs to be cleaned frequently. Therefore,the filter 700 may be detachably arranged at the sewage suction port 100c. In some embodiments, the filter 700 may be funnel-shaped, and theinner wall surface of the sewage suction port 100 c may also be tapered,such that the filter 700 may be directly assembled to the sewage suctionport 100 c by its own gravity.

After cleaning the surface to be cleaned by the mopping members of thecleaning robot, bacteria will be attached to or breed on the surface ofthe mopping members of the cleaning robot, and thus the cleaning liquidcleaning the mopping members of the cleaning robot becomes sewagecarrying bacteria, viruses and other microorganisms. When the sewage isrecycled into the liquid storage tank 600, a large number ofmicroorganisms will breed, and then the liquid storage tank 600 willstink. In view of this, the sterilization device 400 is connected to thepipeline connecting the sewage pumping device 200 with the liquidstorage tank 600, so as to sterilize the sewage flowing back into theliquid storage tank 600.

Furthermore, the sterilization device 400 is located at the liquidoutlet side of the filtering device 300, that is, the liquid flowingback into the liquid storage tank 600 passes through the filteringdevice 300 and the sterilization device 400 in sequence. On the onehand, this arrangement can prevent the particles, suspended substancesand other impurities mixed in the returned sewage from affecting thesterilization device 400, and on the other hand, this arrangement canprevent the sterilization device 400 from repeatedly sterilizing theparticles, suspended substances and other impurities blocked by thefiltering device 300.

The sterilization device 400 includes an ozone generator 410, and theozone generator 410 includes an air inlet 4102 and an air outlet 4104.The air inlet 4102 of the ozone generator 410 is in communication withthe environment, and the air outlet 4104 of the ozone generator 410 isin communication with the pipeline connecting the filtering device 300with the liquid storage tank 600. The ozone generated by the ozonegenerator 410 can effectively kill bacteria and viruses in there turnedliquid.

It shall be noted that, a certain air pressure is required for gas toenter the liquid, so the sterilization device 400 may further include anair supply device 420, and the air supply device 420 may be an air pump,a fan or the like. The air supply device 420 is in communication withthe air inlet 4102 of the ozone generator 410 to drive air to passthrough the air inlet 4102 and the air outlet 4104 of the ozonegenerator 410 in sequence. In this way, it can be ensured that enoughair enters the ozone generator 410, such that the ozone generator 410can generate enough ozone, and moreover, it can be ensured that theozone in the ozone generator 410 has air pressure large enough tofacilitate the mixing of ozone with the returned liquid.

Further, the cleaning base station 1000 further includes a three-waypipe 800. For convenience of describing the connection relationships,one pipe in the three-way pipe 800 is defined as a first pipe 810 andthe other two pipes in the three-way pipe 800 are defined as secondpipes 820. The two second pipes 820 are both in communication with thefirst pipe 810. The first pipe 810 is in communication with the liquidstorage tank 600 through a pipeline, one of the two second pipes 820 isin communication with the liquid outlet end of the filtering device 300,and the other one of the two second pipes 820 is in communication withthe air outlet 4104 of the ozone generator 410. This arrangementfacilitates the communication between the ozone generator 410 and thesewage backflow pipeline, and further facilitates the assembly ofcomponents in the cleaning base station 1000.

Furthermore, the cleaning base station 1000 further includes a one-wayvalve 900, one end of the one-way valve 900 is in communication with theair outlet 4104 of the ozone generator 410, and the other end of theone-way valve 900 is in communication with the corresponding second pipe820 in the three-way pipe 800. The arrangement of the one-way valve 900can make the ozone generated in the ozone generator 410 to be dischargedonly from the air outlet 4104 of the ozone generator 410, and at thesame time restrict the sewage backflow from flowing into the ozonegenerator 410 through the one-way valve 900, which is beneficial forensuring the effective operation of the ozone generator 410.

It shall be noted that, the sewage generated from the process ofcleaning the cleaning members of the cleaning robot is finite. If thesewage pumping device 200 still works after sewage pumping has beenfinished, the sewage pumping device 200 is likely to be damaged due toidle motion. In view of this, the cleaning base station 1000 is furtherprovided with a liquid detection device 950, and the liquid detectiondevice 950 may be a liquid detector. The liquid detection device 950 isarranged on the pipeline connecting the sewage pumping device 200 withthe sewage suction port 100 c or the pipeline connecting the sewagepumping device 200 with the liquid storage tank 600. The cleaning basestation 1000 is further provided with a control device 960. The controldevice 960 is configured to control the sewage pumping device 200 towork according to a detection result of the liquid detection device 950.The control device 960 controls the sewage pumping device 200 to stopworking when no sewage flowing back into the liquid storage tank 600through the sewage pumping device 200 is detected by the liquiddetection device 950, thereby preventing the sewage pumping device 200from being damaged due to idle motion.

It shall be noted that, all of the debris suction device 110, the sewagepumping device 200, the cleaning liquid pumping device 210, thefiltering device 300 and the sterilization device 400 may beelectrically connected with the control device 960, and the controldevice 960 can control the corresponding devices to work according tothe received instructions, thereby completing the maintenance of thecleaning robot.

Referring to FIG. 6 , another embodiment of the present disclosurefurther provides a cleaning robot system 2000, and the cleaning robotsystem 2000 includes a cleaning robot 2100 and the cleaning base station1000. The cleaning base station 1000 is configured to maintain thecleaning robot 2100. Reference may be made to the above-mentionedembodiments for specific structure of the cleaning base station 1000. Asthe cleaning robot system 2000 adopts all the technical solutions of allthe above-mentioned embodiments, it has at least all the beneficialeffects brought by the technical solutions of the above-mentionedembodiments, and this will not be further described herein.

What described above are only some embodiments of the presentdisclosure, and are not intended to limit the protective scope claimedin the present disclosure. Any equivalent structures or modificationsthat are made according to the specification and the attached drawingsof the present disclosure under the concept of the present disclosure,or any direct/indirect applications of the present disclosure in otherrelated technical fields shall all be included within the protectivescope claimed in the present disclosure.

What is claimed is:
 1. A cleaning base station for a cleaning robot, comprising a base, the base defining a maintenance space, the cleaning base station further comprising at least two of a debris suction device, a sewage pumping device, a cleaning liquid pumping device, a filtering device and a sterilization device, and the at least two of the debris suction device, the sewage pumping device, the cleaning liquid pumping device, the filtering device and the sterilization device being installed in the maintenance space.
 2. The cleaning base station of claim 1, wherein the base defines an accommodating cavity and a maintenance opening in communication with the accommodating cavity, and the accommodating cavity forms the maintenance space; the cleaning base station further comprises a maintenance plate connected with the base, and the maintenance plate is configured to cover or open the maintenance opening.
 3. The cleaning base station of claim 2, wherein the maintenance opening is defined on a side surface of the base.
 4. The cleaning base station of claim 2, wherein the base comprises a chassis, a liquid tank bracket and a back cover, the liquid tank bracket is installed above the chassis, the back cover is configured to cover a back side of the chassis and a back side of the liquid tank bracket, the accommodating cavity is cooperatively defined by the back cover and the liquid tank bracket, and the maintenance opening is defined on the back cover.
 5. The cleaning base station of claim 4, wherein a surface part of the liquid tank bracket facing the back cover is recessed to form an installation recess, the installation recess is configured to accommodate the at least two of the debris suction device, the sewage pumping device, the cleaning liquid pumping device, the filtering device and the sterilization device, and the back cover covers the installation recess to form the accommodating cavity.
 6. The cleaning base station of claim 1, wherein the base defines a cleaning space for the cleaning robot to park, and the base further defines a sewage suction port located below the cleaning space; the cleaning base station further comprises a liquid storage tank mounted on the base, a liquid inlet end of the cleaning liquid pumping device is in communication with the liquid storage tank, and a liquid outlet end of the cleaning liquid pumping device extends to the cleaning space; a liquid inlet end of the sewage pumping device is in communication with the sewage suction port, a liquid outlet end of the sewage pumping device is in communication with the liquid storage tank, and the filtering device is connected in series with the sewage pumping device and the liquid storage tank.
 7. The cleaning base station of claim 6, wherein the sewage suction port is arranged at a lowest position of the cleaning space.
 8. The cleaning base station of claim 6, wherein the filtering device is connected in series with the sewage pumping device and the liquid storage tank, and the sterilization device is located at a liquid outlet side of the filtering device.
 9. The cleaning base station of claim 6, wherein the sterilization device is connected to a pipeline connecting the sewage pumping device with the liquid storage tank.
 10. The cleaning base station of claim 9, wherein the sterilization device comprises an ozone generator and an air supply device, an air inlet of the ozone generator is in communication with the air supply device, and an air outlet of the ozone generator is in communication with the pipeline connecting the sewage pumping device with the liquid storage tank.
 11. The cleaning base station of claim 10, wherein the filtering device is connected in series between the sewage pumping device and the liquid storage tank; the cleaning base station further comprises a three-way pipe, the three-way pipe comprises a first pipe and two second pipes, the two second pipes are both in communication with the first pipe, the first pipe is in communication with the liquid storage tank, one of the two second pipes is in communication with a liquid outlet end of the filtering device, and the other of the two second pipes is in communication with the air outlet of the ozone generator.
 12. The cleaning base station of claim 11, wherein the cleaning base station further comprises a one-way valve, one end of the one-way valve is in communication with the air outlet of the ozone generator, and the other end of the one-way valve is in communication with a corresponding one of the two second pipes of the three-way pipe.
 13. The cleaning base station of claim 9, wherein the sterilization device comprises an ozone generator, an air inlet of the ozone generator is in communication with the environment, and an air outlet of the ozone generator is in communication with a pipeline connecting the filtering device with the liquid storage tank.
 14. The cleaning base station of claim 13, wherein the cleaning base station further comprises a three-way pipe, the three-way pipe comprises a first pipe and two second pipes, the two second pipes are both in communication with the first pipe, the first pipe is in communication with the liquid storage tank, one of the two second pipes is in communication with a liquid outlet end of the filtering device, and the other of the two second pipes is in communication with the air outlet of the ozone generator.
 15. The cleaning base station of claim 14, wherein the cleaning base station further comprises a one-way valve, one end of the one-way valve is in communication with the air outlet of the ozone generator, and the other end of the one-way valve is in communication with a corresponding one of the two second pipes of the three-way pipe.
 16. The cleaning base station of claim 6, wherein the cleaning base station further comprises a filter, and the filter is arranged at the sewage suction port.
 17. The cleaning base station of claim 16, wherein the filter is funnel-shaped.
 18. The cleaning base station of claim 6, wherein the cleaning base station further comprises a liquid detection device, and the liquid detection device is arranged on a pipeline connecting the sewage pumping device with the sewage suction port or a pipeline connecting the sewage pumping device with the liquid storage tank; the cleaning base station further comprises a control device electrically connected with the liquid detection device and the sewage pumping device, and the control device is configured to control the sewage pumping device to work according to a detection result of the liquid detection device.
 19. A cleaning robot system, comprising a cleaning robot and the cleaning base station of claim 1, and the cleaning base station configured to maintain the cleaning robot. 